(Photo @ Markus Steur / THIEMT)
Instrument | Location | Person in Charge |
RIE, Oxford PlasmaPro100 | ZGH Cleanroom
Dry Etching Lab 03-208 |
Dr. Dennis Naujoks |
RIBE, Oxford Ionfab300Plus | ZGH Cleanroom
Dry Etching Lab 03-208 |
Dr. Dennis Naujoks |
ASE, Oxford PlasmaPro Estrelas 100 | ZGH Cleanroom
Dry Etching Lab 03-208 |
Dr. Dennis Naujoks |
PECVD, Oxford PlasmaPro100 | ZGH Cleanroom
Dry Etching Lab 03-208 |
Dr. Dennis Naujoks |